Invention Grant
- Patent Title: Beam profile ellipsometer with rotating compensator
- Patent Title (中): 带旋转补偿器的光束椭偏仪
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Application No.: US11715584Application Date: 2007-03-08
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Publication No.: US07400403B2Publication Date: 2008-07-15
- Inventor: Jon Opsal
- Applicant: Jon Opsal
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corp.
- Current Assignee: KLA-Tencor Corp.
- Current Assignee Address: US CA Milpitas
- Agency: Stallman & Pollock LLP
- Main IPC: G01J4/00
- IPC: G01J4/00

Abstract:
An optical inspection device includes a light source for generating a probe beam. The probe beam is focused onto a sample to create a spread of angles of incidence. After reflecting from the sample, the light is imaged onto a two dimensional array of photodetectors. Prior to reaching the detector array, the beam is passed through a rotating compensator. A processor functions to evaluate the sample by analyzing the output of the photodetectors lying along one or more azimuthal angles and at different compensator positions.
Public/Granted literature
- US20070159630A1 Beam profile ellipsometer with rotating compensator Public/Granted day:2007-07-12
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