发明授权
US07407893B2 Liquid precursors for the CVD deposition of amorphous carbon films
有权
用于CVD沉积无定形碳膜的液体前体
- 专利标题： Liquid precursors for the CVD deposition of amorphous carbon films
- 专利标题（中）： 用于CVD沉积无定形碳膜的液体前体
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申请号： US11065464申请日： 2005-02-24
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公开(公告)号： US07407893B2公开(公告)日： 2008-08-05
- 发明人: Martin Jay Seamons , Wendy H. Yeh , Sudha S. R. Rathi , Deenesh Padhi , Andy (Hsin Chiao) Luan , Sum-Yee Betty Tang , Priya Kulkarni , Visweswaren Sivaramakrishnan , Bok Hoen Kim , Hichem M'Saad , Yuxiang May Wang , Michael Chiu Kwan
- 申请人： Martin Jay Seamons , Wendy H. Yeh , Sudha S. R. Rathi , Deenesh Padhi , Andy (Hsin Chiao) Luan , Sum-Yee Betty Tang , Priya Kulkarni , Visweswaren Sivaramakrishnan , Bok Hoen Kim , Hichem M'Saad , Yuxiang May Wang , Michael Chiu Kwan
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Patterson & Sheridan
- 主分类号： H01L21/31
- IPC分类号： H01L21/31 ; H01L21/461
摘要：
Methods are provided for depositing amorphous carbon materials. In one aspect, the invention provides a method for processing a substrate including positioning the substrate in a processing chamber, introducing a processing gas into the processing chamber, wherein the processing gas comprises a carrier gas, hydrogen, and one or more precursor compounds, generating a plasma of the processing gas by applying power from a dual-frequency RF source, and depositing an amorphous carbon layer on the substrate.
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