发明授权
- 专利标题: EUV light source
- 专利标题(中): EUV光源
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申请号: US11647016申请日: 2006-12-27
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公开(公告)号: US07411203B2公开(公告)日: 2008-08-12
- 发明人: Igor V. Fomenkov , Alexander I. Ershov
- 申请人: Igor V. Fomenkov , Alexander I. Ershov
- 申请人地址: US CA San Diego
- 专利权人: Cymer, Inc.
- 当前专利权人: Cymer, Inc.
- 当前专利权人地址: US CA San Diego
- 代理商 William C. Cray
- 主分类号: H01J49/00
- IPC分类号: H01J49/00
摘要:
An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a ibeus defining a desired plasma initiation site, comprising; a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis genemily perpendicular to the target stream track from a desired stream truck intersecting the desired plasma initiation site.
公开/授权文献
- US20070158597A1 EUV light source 公开/授权日:2007-07-12
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