Invention Grant
- Patent Title: Reaction apparatus and mixing system
- Patent Title (中): 反应装置和混合系统
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Application No.: US10283215Application Date: 2002-10-30
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Publication No.: US07413713B2Publication Date: 2008-08-19
- Inventor: Tadashi Sano , Ryo Miyake , Akira Koide , Norihide Saho , Akiomi Kono , Takeshi Harada
- Applicant: Tadashi Sano , Ryo Miyake , Akira Koide , Norihide Saho , Akiomi Kono , Takeshi Harada
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2001-332416 20011030; JP2002-131236 20020507
- Main IPC: B01J10/00
- IPC: B01J10/00 ; B01J10/02 ; B01J12/00 ; B01J12/02 ; B01J14/00

Abstract:
A reaction apparatus comprises a first supply flow channel having a fine flow channel cross sectional area for a liquid pressurized by a pressurizing device, a gas supply flow channel having a fine flow channel cross sectional area for supplying a gas, a two-phase flow channel having a fine flow channel cross sectional area in communication with a joined portion for the first supply flow channel and the second supply flow channel for flowing a gas/liquid two-phase fluid, a gas bubble reaction flow channel in communication with the exit of the gas/liquid two-phase channel and having a flow channel cross sectional area larger than that of the gas/liquid two-phase flow channel, and a liquid discharge flow channel for discharging the liquid in the gas bubble reaction flow channel. Therefore, in the reaction apparatus, a stable mixing ratio of a gas to a liquid can be obtained and the mixing speed of the gas to the liquid is increased.
Public/Granted literature
- US20030086842A1 Reaction apparatus and mixing system Public/Granted day:2003-05-08
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