发明授权
- 专利标题: Lithographic printing plate support and method of manufacturing the same
- 专利标题(中): 平版印刷版支持及其制造方法
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申请号: US11377546申请日: 2006-03-17
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公开(公告)号: US07413844B2公开(公告)日: 2008-08-19
- 发明人: Atsushi Matsuura , Hirokazu Sawada , Akio Uesugi
- 申请人: Atsushi Matsuura , Hirokazu Sawada , Akio Uesugi
- 申请人地址: JP Tokyo
- 专利权人: FUJIFILM Corporation
- 当前专利权人: FUJIFILM Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Sughrue Mion, PLLC
- 优先权: JP2005-077599 20050317
- 主分类号: G03F7/00
- IPC分类号: G03F7/00 ; C25D5/44
摘要:
A lithographic printing plate support capable of obtaining a presensitized plate which is excellent in scumming resistance and scratch resistance and achieves a good balance between sensitivity and press life, and a method of manufacturing the support are provided. The support includes a surface which has an arithmetic mean roughness Ra of 0.36 to 0.50 μm; not more than 3.0 recesses with a depth of at least 4 μm per 400 μm square region; and a surface area ratio ΔS5(0.02-0.2) determined from Sx5(0.02-0.2) denoting the actual surface area of a 5 μm square surface region as determined by three-point approximation based on data obtained by extracting 0.02 to 0.2 μm wavelength components from three-dimensional data on the surface region measured with an atomic force microscope at 512×512 points and S0 denoting the geometrically measured surface area of the surface region, of 50 to 90%.
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