发明授权
US07414251B2 Method for providing an operable filter system for filtering particles out of a beam of radiation, filter system, apparatus and lithographic apparatus comprising the filter system
失效
用于提供可操作的滤波器系统的方法，用于从辐射束，滤波器系统，装置和包括滤波器系统的光刻设备中过滤颗粒
- 专利标题： Method for providing an operable filter system for filtering particles out of a beam of radiation, filter system, apparatus and lithographic apparatus comprising the filter system
- 专利标题（中）： 用于提供可操作的滤波器系统的方法，用于从辐射束，滤波器系统，装置和包括滤波器系统的光刻设备中过滤颗粒
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申请号： US11317240申请日： 2005-12-27
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公开(公告)号： US07414251B2公开(公告)日： 2008-08-19
- 发明人: Levinus Pieter Bakker
- 申请人： Levinus Pieter Bakker
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman, LLP
- 主分类号： H05G2/00
- IPC分类号： H05G2/00
摘要：
A method for providing an operable filter system for filtering particles out of a beam of radiation in lithography is disclosed. The method includes providing a slack foil or wire for intercepting the particles, mounting at least a first point or side of the foil or wire to a first position of a mounting assembly, and substantially stretching the slack foil or wire at least within the beam of radiation, substantially parallel to a direction in which the radiation propagates.