Invention Grant
US07422917B2 Forming tapered lower electrode phase-change memories 有权
形成锥形下电极相变存储器

  • Patent Title: Forming tapered lower electrode phase-change memories
  • Patent Title (中): 形成锥形下电极相变存储器
  • Application No.: US11102998
    Application Date: 2005-04-11
  • Publication No.: US07422917B2
    Publication Date: 2008-09-09
  • Inventor: Daniel Xu
  • Applicant: Daniel Xu
  • Applicant Address: US ID Boise
  • Assignee: Ovonyx, Inc.
  • Current Assignee: Ovonyx, Inc.
  • Current Assignee Address: US ID Boise
  • Agency: Trop, Pruner & Hu, P.C.
  • Main IPC: H01L21/00
  • IPC: H01L21/00
Forming tapered lower electrode phase-change memories
Abstract:
A phase-change memory may have a tapered lower electrode coated with an insulator. The coated, tapered electrode acts as a mask for a self-aligned trench etch to electrically separate adjacent wordlines. In some embodiments, the tapered lower electrode may be formed over a plurality of doped regions, and isotropic etching may be used to taper the electrode as well as part of the underlying doped regions.
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