Invention Grant
- Patent Title: Forming tapered lower electrode phase-change memories
- Patent Title (中): 形成锥形下电极相变存储器
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Application No.: US11102998Application Date: 2005-04-11
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Publication No.: US07422917B2Publication Date: 2008-09-09
- Inventor: Daniel Xu
- Applicant: Daniel Xu
- Applicant Address: US ID Boise
- Assignee: Ovonyx, Inc.
- Current Assignee: Ovonyx, Inc.
- Current Assignee Address: US ID Boise
- Agency: Trop, Pruner & Hu, P.C.
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A phase-change memory may have a tapered lower electrode coated with an insulator. The coated, tapered electrode acts as a mask for a self-aligned trench etch to electrically separate adjacent wordlines. In some embodiments, the tapered lower electrode may be formed over a plurality of doped regions, and isotropic etching may be used to taper the electrode as well as part of the underlying doped regions.
Public/Granted literature
- US20050180191A1 Forming tapered lower electrode phase-change memories Public/Granted day:2005-08-18
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