发明授权
- 专利标题: Semiconductor device and method for manufacturing the same
- 专利标题(中): 半导体装置及其制造方法
-
申请号: US11265208申请日: 2005-11-03
-
公开(公告)号: US07423315B2公开(公告)日: 2008-09-09
- 发明人: Hideki Okumura , Hitoshi Kobayashi , Masanobu Tsuchitani , Satoshi Aida , Shigeo Kouzuki , Masaru Izumisawa , Satoshi Taji , Kenichi Tokano
- 申请人: Hideki Okumura , Hitoshi Kobayashi , Masanobu Tsuchitani , Satoshi Aida , Shigeo Kouzuki , Masaru Izumisawa , Satoshi Taji , Kenichi Tokano
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- 优先权: JP2004-322494 20041105
- 主分类号: H01L29/36
- IPC分类号: H01L29/36
摘要:
The present application provides a semiconductor device including a first-conductivity type semiconductor substrate, a pillar structure portion formed on the first-conductivity type semiconductor substrate and formed of five semiconductor pillar layers arranged in one direction parallel to a main surface of the first-conductivity type semiconductor substrate, and isolation insulating portions formed on the first-conductivity type semiconductor substrate and sandwiching the pillar structure portion between the isolation insulating portions, wherein the pillar structure portion is formed of a first first-conductivity type pillar layer, a second first-conductivity type pillar layer and a third first-conductivity type pillar layer which sandwich the first first-conductivity type pillar layer, a first second-conductivity type pillar layer provided between the first first-conductivity type pillar layer and the second first-conductivity type pillar layer, and a second second-conductivity type pillar layer provided between the first first-conductivity type pillar layer and the third first-conductivity type pillar layer.
公开/授权文献
信息查询
IPC分类: