An exposure apparatus exposes a substrate to light via a reticle in a vacuum. A projection optical system projects a pattern of the reticle onto the substrate, a stage holds the substrate and moves, and first and second partitions define an exhaust space between a first space accommodating at least a part of the projection optical system and a stage space accommodating the stage. The first partition includes a first opening to make the light pass between the first space and the exhaust space, and the second partition includes a second opening to make the light pass between the exhaust space and the stage space. A first supply system supplies fluid into the stage space, and a first exhaust system recovers fluid from the stage space through the second opening and the exhaust space. A pressure in the exhaust space is lower than those in the first space and the stage space.