发明授权
- 专利标题: Heat-sensitive lithographic printing plate precursor
- 专利标题(中): 热敏平版印刷版前体
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申请号: US10916154申请日: 2004-08-11
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公开(公告)号: US07425402B2公开(公告)日: 2008-09-16
- 发明人: Johan Loccufier , Bert Groenendaal , Marc Van Damme , Huub Van Aert
- 申请人: Johan Loccufier , Bert Groenendaal , Marc Van Damme , Huub Van Aert
- 申请人地址: BE Morstel
- 专利权人: Agfa Graphics, N.V.
- 当前专利权人: Agfa Graphics, N.V.
- 当前专利权人地址: BE Morstel
- 代理机构: Leydig, Voit & Mayer, Ltd.
- 优先权: EP03102522 20030813
- 主分类号: G03C1/77
- IPC分类号: G03C1/77 ; G03F7/09 ; G03F7/038 ; G03F7/039
摘要:
A heat-sensitive lithographic printing plate precursor is disclosed which comprises a hydrophilic support and an oleophilic coating comprising an infrared absorbing agent and a developer soluble polymer which comprises a phenolic monomeric unit wherein the phenyl group of the phenolic monomeric unit is substituted by a group Q, wherein Q has the structure and is covalently linked to a carbon atom of the phenyl group and wherein L1, L2 and L3 are linking groups, a, b and c are 0 or 1, and T1, T2 and T3 are terminal groups. The polymer, substituted by the group Q, increases the chemical resistance of the coating.
公开/授权文献
- US20050037280A1 Heat-sensitive lithographic printing plate precursor 公开/授权日:2005-02-17
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