发明授权
- 专利标题： Method of performing multiple stage model calibration for optical imaging simulation models
- 专利标题（中）： 对光学成像模拟模型进行多级模型校准的方法
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申请号： US11708137申请日： 2007-02-20
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公开(公告)号： US07433791B2公开(公告)日： 2008-10-07
- 发明人: Sangbong Park , Duan-Fu Stephen Hsu , Edita Tejnil
- 申请人： Sangbong Park , Duan-Fu Stephen Hsu , Edita Tejnil
- 申请人地址： NL Veldhoven
- 专利权人： ASML Masktools B.V.
- 当前专利权人： ASML Masktools B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop et al.
- 主分类号： G01D18/00
- IPC分类号： G01D18/00 ; G01B9/00
摘要：
A method of calibrating a simulation model of a photolithography process. The method includes the steps of defining a set of input data; defining a simulation model having model parameters which affect the simulation result produced by the simulation model; performing a first stage calibration process in which the model parameters and alignment parameters are adjusted such that the simulation result is within a first predefined error tolerance; and performing a second stage calibration process in which the alignment parameters are fixed and the model parameters are adjusted such that the simulation result is within a second predefined error tolerance.
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