发明授权
US07436993B2 Apparatus and method for detecting defects in periodic pattern on object
失效
用于检测物体周期性图案缺陷的装置和方法
- 专利标题: Apparatus and method for detecting defects in periodic pattern on object
- 专利标题(中): 用于检测物体周期性图案缺陷的装置和方法
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申请号: US11079331申请日: 2005-03-15
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公开(公告)号: US07436993B2公开(公告)日: 2008-10-14
- 发明人: Hiroyuki Onishi , Yasushi Sasa
- 申请人: Hiroyuki Onishi , Yasushi Sasa
- 申请人地址: JP Kyoto
- 专利权人: Dainippon Screen Mfg. Co., Ltd.
- 当前专利权人: Dainippon Screen Mfg. Co., Ltd.
- 当前专利权人地址: JP Kyoto
- 代理机构: McDermott Will & Emery LLP
- 优先权: JPP2004-123622 20040420
- 主分类号: G06K9/00
- IPC分类号: G06K9/00
摘要:
In a defect detection apparatus, images of first to third inspection areas on a substrate are picked up to acquire first to third images. A positional difference acquisition part (51) acquires a first difference vector between the first image and the second image and a second difference vector between the second image and the third image. A differential image generation part (52) generates a first differential image between the first image and the second image while adjusting a position of the first image to the second image on the basis of the first difference vector and a second differential image between the second image and the third image while adjusting a position of the second image to the third image on the basis of the second difference vector. Then, a position of the second differential image is adjusted to the first differential image on the basis of the second difference vector and the second differential image after position adjustment and the first differential image are compared with each other, to detect a defect in a periodic pattern on the substrate with high accuracy.