Defect inspection apparatus, defect inspection method and program
    1.
    发明授权
    Defect inspection apparatus, defect inspection method and program 失效
    缺陷检查装置,缺陷检查方法和程序

    公开(公告)号:US07440605B2

    公开(公告)日:2008-10-21

    申请号:US10657107

    申请日:2003-09-09

    IPC分类号: G06K9/00

    摘要: A reference image and an inspection image indicating pattern on a substrate are acquired and a specified pixel value range (63) is set on the basis of a histogram (62a) of pixel values of the reference image. Then, a transfer curve (71) having a large inclination in the specified pixel value range (63) is obtained. The inspection image and the reference image are converted in accordance with an LUT having transfer characteristics indicated by the transfer curve (71), an enhanced differential image between a converted inspection image and a converted reference image is generated and each pixel value of the enhanced differential image is compared with a predetermined threshold value, to thereby perform a detection of defective pixel. With this, a value of pixel in the enhanced differential image which corresponds to a pixel in the reference image (or inspection image) having the pixel value in the specified pixel value range (63) is enhanced, and appropriate inspection is thereby performed.

    摘要翻译: 获取基板上的参考图像和检查图像指示图案,并且基于参考图像的像素值的直方图(62a)来设定指定的像素值范围(63)。 然后,获得在指定像素值范围(63)中具有大倾斜度的转印曲线(71)。 检查图像和参考图像根据具有由传送曲线(71)表示的传送特性的LUT进行转换,产生经转换的检查图像和转换的参考图像之间的增强的差分图像,并且增强差分的每个像素值 将图像与预定阈值进行比较,从而执行缺陷像素的检测。 由此,增强了对应于具有指定像素值范围(63)中的像素值的参考图像(或检查图像)中的像素的增强差分图像中的像素的值,从而进行适当的检查。

    Apparatus and method for detecting defects in periodic pattern on object
    2.
    发明申请
    Apparatus and method for detecting defects in periodic pattern on object 失效
    用于检测物体周期性图案缺陷的装置和方法

    公开(公告)号:US20050232478A1

    公开(公告)日:2005-10-20

    申请号:US11079331

    申请日:2005-03-15

    IPC分类号: G01N21/956 G06K9/00 G06T7/00

    CPC分类号: G06T7/0004 G06T2207/30148

    摘要: In a defect detection apparatus, images of first to third inspection areas on a substrate are picked up to acquire first to third images. A positional difference acquisition part (51) acquires a first difference vector between the first image and the second image and a second difference vector between the second image and the third image. A differential image generation part (52) generates a first differential image between the first image and the second image while adjusting a position of the first image to the second image on the basis of the first difference vector and a second differential image between the second image and the third image while adjusting a position of the second image to the third image on the basis of the second difference vector. Then, a position of the second differential image is adjusted to the first differential image on the basis of the second difference vector and the second differential image after position adjustment and the first differential image are compared with each other, to detect a defect in a periodic pattern on the substrate with high accuracy.

    摘要翻译: 在缺陷检测装置中,拾取基板上的第一至第三检查区域的图像以获取第一至第三图像。 位置差异获取部(51)获取第一图像和第二图像之间的第一差分矢量和第二图像与第三图像之间的第二差分矢量。 差分图像生成部件(52)在第一图像和第二图像之间生成第一差分图像,同时基于第一差分矢量和第二图像之间的第二差分图像来调整第一图像的位置到第二图像 以及第三图像,同时基于第二差分矢量调整第二图像的位置与第三图像。 然后,基于第二差分矢量和位置调整之后的第二差分图像将第二差分图像的位置调整为第一差分图像,并将第一差分图像彼此进行比较,以检测周期性的缺陷 图案高精度的衬底。

    Apparatus and method for detecting defects in periodic pattern on object
    3.
    发明授权
    Apparatus and method for detecting defects in periodic pattern on object 失效
    用于检测物体周期性图案缺陷的装置和方法

    公开(公告)号:US07436993B2

    公开(公告)日:2008-10-14

    申请号:US11079331

    申请日:2005-03-15

    IPC分类号: G06K9/00

    CPC分类号: G06T7/0004 G06T2207/30148

    摘要: In a defect detection apparatus, images of first to third inspection areas on a substrate are picked up to acquire first to third images. A positional difference acquisition part (51) acquires a first difference vector between the first image and the second image and a second difference vector between the second image and the third image. A differential image generation part (52) generates a first differential image between the first image and the second image while adjusting a position of the first image to the second image on the basis of the first difference vector and a second differential image between the second image and the third image while adjusting a position of the second image to the third image on the basis of the second difference vector. Then, a position of the second differential image is adjusted to the first differential image on the basis of the second difference vector and the second differential image after position adjustment and the first differential image are compared with each other, to detect a defect in a periodic pattern on the substrate with high accuracy.

    摘要翻译: 在缺陷检测装置中,拾取基板上的第一至第三检查区域的图像以获取第一至第三图像。 位置差异获取部(51)获取第一图像和第二图像之间的第一差分矢量和第二图像与第三图像之间的第二差分矢量。 差分图像生成部件(52)在第一图像和第二图像之间生成第一差分图像,同时基于第一差分矢量和第二图像之间的第二差分图像来调整第一图像的位置到第二图像 以及第三图像,同时基于第二差分矢量调整第二图像的位置与第三图像。 然后,基于第二差分矢量和位置调整之后的第二差分图像将第二差分图像的位置调整为第一差分图像,并将第一差分图像彼此进行比较,以检测周期性的缺陷 图案高精度的衬底。

    Apparatus and method for inspecting pattern on object
    4.
    发明申请
    Apparatus and method for inspecting pattern on object 审中-公开
    检查物体图案的装置和方法

    公开(公告)号:US20050244049A1

    公开(公告)日:2005-11-03

    申请号:US11097139

    申请日:2005-04-04

    摘要: In a pattern inspection apparatus (1), an electron beam emission part (31) emits an electron beam onto a substrate (9) and an image acquisition part (33) detects electrons from the substrate (9) to acquire a grayscale inspection image of the substrate (9). A binary reference image generated from design data (81) is multivalued by a grayscale image generator (52) on the basis of a histogram of pixel values in the inspection image to generate a grayscale reference image. A comparator (53) compares the inspection image with the reference image. The pattern inspection apparatus (1) can thereby perform an inspection of a very small pattern on the substrate (9) on the basis of the design data (81).

    摘要翻译: 在图案检查装置(1)中,电子束发射部(31)将电子束发射到基板(9)上,图像获取部(33)从基板(9)检测电子,获得灰度检查图像 基板(9)。 基于检查图像中的像素值的直方图,通过灰度图像生成器(52)将从设计数据(81)生成的二进制参考图像多值化以生成灰度参考图像。 比较器(53)将检查图像与参考图像进行比较。 因此,图案检查装置(1)能够基于设计数据(81)在基板(9)上进行非常小的图案的检查。

    Apparatus and method for detecting defect existing in pattern on object
    5.
    发明申请
    Apparatus and method for detecting defect existing in pattern on object 审中-公开
    用于检测物体上图案中存在的缺陷的装置和方法

    公开(公告)号:US20060133660A1

    公开(公告)日:2006-06-22

    申请号:US11289708

    申请日:2005-11-30

    IPC分类号: G06K9/00

    CPC分类号: G06T7/001 G06T2207/30148

    摘要: In a defect detection apparatus 1, in a reference image inspection circuit 42 compared are a reference image representing a pattern in a die which is determined as a reference on a substrate 9 and a plurality of supervisory images which represent patterns in selected block areas, respectively, to detect defects included in the reference image. Subsequently, in the target image inspection circuit 44, a target image representing a pattern in another die and the reference image are compared to detect a plurality of defect candidates included in the target image. Then, a defect detector 45 excludes defect candidates overlapping with the defects included in the reference image from the plurality of defect candidates on the basis of at least positional information of the defects included in the reference image. This makes it possible to detect defects existing in the pattern in another die accurately while eliminating effects of the defects existing in the pattern in the die which is determined as the reference.

    摘要翻译: 在缺陷检测装置1中,在比较的参照图像检查电路42中,分别表示作为基板9的基准的芯片中的图案的参考图像和分别表示所选块区域中的图案的多个监视图像 以检测参考图像中包含的缺陷。 随后,在目标图像检查电路44中,比较表示另一管芯中的图案的目标图像和参考图像,以检测包括在目标图像中的多个缺陷候选。 然后,缺陷检测器45至少基于包含在参考图像中的缺陷的位置信息,排除与来自多个缺陷候补的参考图像中包含的缺陷重叠的缺陷候选。 这使得可以精确地检测存在于另一个模具中的图案中的缺陷,同时消除存在于作为基准的芯片中的图案中存在的缺陷的影响。

    Apparatus and method for detecting defects of pattern on object
    6.
    发明申请
    Apparatus and method for detecting defects of pattern on object 审中-公开
    用于检测物体上图案缺陷的装置和方法

    公开(公告)号:US20050271261A1

    公开(公告)日:2005-12-08

    申请号:US11137554

    申请日:2005-05-26

    摘要: In a defect detection apparatus (1) acquired is two-dimensional image data of a swath which is a strip-like area corresponding to one of a plurality of divided patterns which are obtained by dividing a pattern block on one die of a substrate (9). In the defect detection apparatus (1), a reference image acquired from one swath in a reference die is stored in an image memory (51) and the reference image is compared with an inspection image acquired from a swath corresponding to a reference image on an inspection die by a defect detector (52) to detect defects of the inspection image. As a result, it is possible to easily achieve a defect detection of a fine pattern formed on a swath of the inspection die while reducing storage capacity required for the image memory (51).

    摘要翻译: 在获取的缺陷检测装置(1)中,作为与通过将基板的一个管芯(9)上的图案块分割而得到的多个分割图案中的一个划分的图案的条状区域的条带的二维图像数据 )。 在缺陷检测装置(1)中,将从参考管芯中的一个条带获取的参考图像存储在图像存储器(51)中,并将参考图像与从对应于参考图像的条纹获取的检查图像进行比较 由缺陷检测器(52)检查模具,以检测检查图像的缺陷。 结果,能够容易地实现在检查模具的条带上形成的精细图案的缺陷检测,同时降低图像存储器(51)所需的存储容量。

    Pattern inspection apparatus and method

    公开(公告)号:US07024041B2

    公开(公告)日:2006-04-04

    申请号:US10216320

    申请日:2002-08-12

    申请人: Yasushi Sasa

    发明人: Yasushi Sasa

    IPC分类号: G06K9/68

    摘要: A marginal distribution feature extraction unit 20 sequentially focuses on each pixel in a reference image and the corresponding pixel in an inspection image, and computes a marginal distribution feature value indicative of the spatial variation in pixel values in the focus pixel neighborhood in both images. Based on this marginal distribution feature value, a tolerance image generation selection unit 26 sets a tolerance range for the reference image or inspection image focus pixel with the less spatial variation. A target image selection unit 30 selects the image comprising pixels from both images for which a tolerance range is not set as a target image. Referencing the set tolerance ranges, a comparison operator 34 compares each pixel in the target image and tolerance image, and outputs a difference Sub representing how far the pixel values of the target image are from the respective tolerance range. A defect determination circuit 38 then outputs data indicating the pixels corresponding to a defect based on a difference map containing these difference Sub values.