发明授权
- 专利标题： Method for production of electron source substrate provided with electron emitting element and method for production of electronic device using the substrate
- 专利标题（中）： 具有电子发射元件的电子源基板的制造方法及使用该基板的电子器件的制造方法
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申请号： US10853762申请日： 2004-05-26
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公开(公告)号： US07442405B2公开(公告)日： 2008-10-28
- 发明人: Masahiko Miyamoto , Mitsutoshi Hasegawa , Kazuhiro Sando , Kazuya Shigeoka
- 申请人： Masahiko Miyamoto , Mitsutoshi Hasegawa , Kazuhiro Sando , Kazuya Shigeoka
- 申请人地址： JP Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JP Tokyo
- 代理机构： Fitzpatrick, Cella, Harper & Scinto
- 优先权： JP9-085547 19970321; JP10-085065 19980317
- 主分类号： B05D5/12
- IPC分类号： B05D5/12
摘要：
A novel process for producing an electron source substrate is disclosed for formation of electron-emitting element at high efficiency with less shape irregularity. In the process, the region for electroconductive film formation is divided into plural subregions on which an electroconductive film is formed respectively. In forming the electroconductive film by application of plural liquids, the time interval between the application of the two drops is controlled to be larger than the time length necessary for suppressing the spreading of the succeedingly applied liquid within an allowable limit.
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