发明授权
- 专利标题: Methods, systems, and polymer substances relating to consideration of H2O levels present within an atmospheric-pressure nitrogen dielectric-barrier discharge
- 专利标题(中): 与大气压氮介质阻挡放电中存在的H2O水平相关的方法,系统和聚合物物质
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申请号: US10883263申请日: 2004-07-01
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公开(公告)号: US07442442B2公开(公告)日: 2008-10-28
- 发明人: Mark A. Strobel , Seth M. Kirk , Joel A. Getschel , Matthew J. Skaruppa
- 申请人: Mark A. Strobel , Seth M. Kirk , Joel A. Getschel , Matthew J. Skaruppa
- 申请人地址: US MN St. Paul
- 专利权人: 3M Innovative Properties Company
- 当前专利权人: 3M Innovative Properties Company
- 当前专利权人地址: US MN St. Paul
- 主分类号: B05D3/00
- IPC分类号: B05D3/00
摘要:
Methods and systems utilize an atmospheric-pressure nitrogen dielectric-barrier discharge to treat the surface of polymer substances. The atmospheric-pressure nitrogen dielectric-discharge may be maintained with a level of H2O below a pre-defined amount, such as by measuring and controlling the H2O within a treater, to produce a surface treatment for a polymer substance that yields desirable characteristics. Furthermore, the H2O level may be measured and controlled according to a pre-defined amount or according to another parameter such as an analysis of the resulting polymer surface. For example, the polymer surface may be provided with an optimal added nitrogen-to-added oxygen ratio and/or an optimal stability based on washed and unwashed advancing contact angles such as by controlling the H2O level within the treater based on these analyses of the treated polymer.
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