公开(公告)号：US07442442B2

公开(公告)日：2008-10-28

申请号：US10883263

申请日：2004-07-01

申请人： Mark A. Strobel ,  Seth M. Kirk ,  Joel A. Getschel ,  Matthew J. Skaruppa

发明人： Mark A. Strobel ,  Seth M. Kirk ,  Joel A. Getschel ,  Matthew J. Skaruppa

IPC分类号： B05D3/00

CPC分类号： C08J7/123 ,  B29C59/12 ,  Y10T428/31656 ,  Y10T428/31938

摘要： Methods and systems utilize an atmospheric-pressure nitrogen dielectric-barrier discharge to treat the surface of polymer substances. The atmospheric-pressure nitrogen dielectric-discharge may be maintained with a level of H2O below a pre-defined amount, such as by measuring and controlling the H2O within a treater, to produce a surface treatment for a polymer substance that yields desirable characteristics. Furthermore, the H2O level may be measured and controlled according to a pre-defined amount or according to another parameter such as an analysis of the resulting polymer surface. For example, the polymer surface may be provided with an optimal added nitrogen-to-added oxygen ratio and/or an optimal stability based on washed and unwashed advancing contact angles such as by controlling the H2O level within the treater based on these analyses of the treated polymer.

摘要翻译： 方法和系统利用大气压氮介质阻挡放电来处理聚合物物质的表面。 大气压氮介质放电可以以低于预定量的H 2 O 2水平保持，例如通过测量和控制H 2 O 3 O内的H 2 O 处理器，以产生产生期望特性的聚合物物质的表面处理。 此外，H 2 O水平可以根据预定量或根据另一参数如所得聚合物表面的分析来测量和控制。 例如，聚合物表面可以被提供有最佳的添加氮与氧的比例和/或基于洗涤和未洗涤的前进接触角的最佳稳定性，例如通过控制H 2 O 2水平 基于处理过的聚合物的这些分析。