发明授权
US07442477B2 Exposing apparatus and exposing method, for maskless exposure of substrate to be exposed, and plotter and plotting method for directly plotting on object to be plotted
有权
曝光装置和曝光方法,用于无曝光曝光的基板,以及用于直接绘制在要绘制的对象上的绘图仪和绘图方法
- 专利标题: Exposing apparatus and exposing method, for maskless exposure of substrate to be exposed, and plotter and plotting method for directly plotting on object to be plotted
- 专利标题(中): 曝光装置和曝光方法,用于无曝光曝光的基板,以及用于直接绘制在要绘制的对象上的绘图仪和绘图方法
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申请号: US10809372申请日: 2004-03-26
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公开(公告)号: US07442477B2公开(公告)日: 2008-10-28
- 发明人: Kazunari Sekigawa , Masatoshi Akagawa
- 申请人: Kazunari Sekigawa , Masatoshi Akagawa
- 申请人地址: JP Nagano
- 专利权人: Shinko Electric Industries Co., Ltd.
- 当前专利权人: Shinko Electric Industries Co., Ltd.
- 当前专利权人地址: JP Nagano
- 代理机构: Staas & Halsey LLP
- 优先权: JP2003-100377 20030403
- 主分类号: G03C5/00
- IPC分类号: G03C5/00 ; G03F9/00
摘要:
An exposing apparatus for irradiating desired spots on a substrate to be exposed relatively moving with respect to two or more light sources arranged along the direction of the relative movement to form a desired exposure pattern using the light sources comprises a control means for controlling the turning-on of only specific light sources out of the two or more light sources at a specific timing.
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