Invention Grant
- Patent Title: Working method using scanning probe
- Patent Title (中): 使用扫描探头的工作方法
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Application No.: US11370006Application Date: 2006-03-04
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Publication No.: US07442925B2Publication Date: 2008-10-28
- Inventor: Masatoshi Yasutake , Takuya Nakaue , Kazutoshi Watanabe , Osamu Takaoka , Atsushi Uemoto , Naoya Watanabe , Yoshiteru Shikakura
- Applicant: Masatoshi Yasutake , Takuya Nakaue , Kazutoshi Watanabe , Osamu Takaoka , Atsushi Uemoto , Naoya Watanabe , Yoshiteru Shikakura
- Applicant Address: JP
- Assignee: SII Nanotechnology Inc.
- Current Assignee: SII Nanotechnology Inc.
- Current Assignee Address: JP
- Agency: Adams & Wilks
- Priority: JP2005-063693 20050308; JP2006-018919 20060127
- Main IPC: G01N13/16
- IPC: G01N13/16

Abstract:
The present invention provides a working method using a scanning probe which can enhance a working speed and prolong a lifetime of the probe. The present invention provides the working method using a scanning probe which works a sample by performing the relative scanning of a probe supported on a cantilever on the sample at a predetermined scanning speed. The working method can work the object to be worked while forcibly and relatively vibrating the probe in the direction orthogonal to or parallel to a working surface of the sample at low frequency of 100 to 1000 Hz.
Public/Granted literature
- US20060219901A1 Working method using scanning probe Public/Granted day:2006-10-05
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