Invention Grant
- Patent Title: Charged particle beam apparatus
- Patent Title (中): 带电粒子束装置
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Application No.: US11509520Application Date: 2006-08-24
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Publication No.: US07442942B2Publication Date: 2008-10-28
- Inventor: Haruo Takahashi , Toshiaki Fujii , Yutaka Ikku , Kouji Iwasaki , Yo Yamamoto
- Applicant: Haruo Takahashi , Toshiaki Fujii , Yutaka Ikku , Kouji Iwasaki , Yo Yamamoto
- Applicant Address: JP
- Assignee: SII Nanotechnology Inc.
- Current Assignee: SII Nanotechnology Inc.
- Current Assignee Address: JP
- Agency: Adams & Wilks
- Priority: JP2005-251415 20050831
- Main IPC: H01J37/20
- IPC: H01J37/20

Abstract:
To include a focused ion beam apparatus fabricating a sliced specimen by processing a specimen as well as observing the sliced specimen, a scanning electron microscope observing the slice specimen, a gas-ion beam irradiation apparatus performing finishing processing by irradiating a gas-ion beam onto a surface of the sliced specimen, a specimen stage on which the sliced specimen is fixed and having at least one or more rotation axis, a specimen posture recognition means recognizing positional relation of the sliced specimen with respect to the specimen stage and a specimen stage control means controlling the specimen stage based on a specimen posture recognized by the posture recognition means and an installation angle of the gas-ion beam irradiation apparatus in order to allow an incident angle of the gas-ion beam with respect to the obverse or the reverse of the sliced specimen to be a desired value.
Public/Granted literature
- US20070045560A1 Charged particle beam apparatus Public/Granted day:2007-03-01
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