公开(公告)号：US07973280B2

公开(公告)日：2011-07-05

申请号：US12378138

申请日：2009-02-11

申请人： Haruo Takahashi ,  Yutaka Ikku ,  Yo Yamamoto ,  Kouji Iwasaki

发明人： Haruo Takahashi ,  Yutaka Ikku ,  Yo Yamamoto ,  Kouji Iwasaki

IPC分类号： G01N23/00 ,  H01J27/00

CPC分类号： H01J37/3056 ,  G01N1/286 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J37/3005 ,  H01J37/3045 ,  H01J2237/31745 ,  H01J2237/31749

摘要： An apparatus is provided that precisely conduct ion beam etching to a sample having the properties of which easily change by electron beam irradiation with no loss of ease of operation and throughput. An apparatus includes an ion beam lens barrel and an electron beam lens barrel, which can observe or measure the conditions of a sample with an electron beam in the process of etching with an ion beam, wherein first, an observation image is obtained that includes the entire process area formed by secondary signals generated by an electron beam, secondly, an irradiation permit area and an irradiation inhibit area are defined in the observation image, and thirdly, electron beam irradiation is restricted only to the irradiation permit area.

摘要翻译： 提供了一种设备，其精确地将离子束蚀刻导入具有易于通过电子束照射而改变的性质的样品，而不会损失操作容易性和生产量。 一种装置包括离子束透镜镜筒和电子束透镜镜筒，其可以在用离子束蚀刻的过程中观察或测量具有电子束的样品的条件，其中首先获得包括 在观察图像中定义由电子束产生的二次信号形成的整个处理区域，其次，照射许可区域和照射禁止区域，第三，电子束照射仅限于照射许可区域。

公开(公告)号：US20090206254A1

公开(公告)日：2009-08-20

申请号：US12378138

申请日：2009-02-11

申请人： Haruo Takahashi ,  Yutaka Ikku ,  Yo Yamamoto ,  Kouji Iwasaki

发明人： Haruo Takahashi ,  Yutaka Ikku ,  Yo Yamamoto ,  Kouji Iwasaki

IPC分类号： G01N23/00 ,  A61N5/00

CPC分类号： H01J37/3056 ,  G01N1/286 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J37/3005 ,  H01J37/3045 ,  H01J2237/31745 ,  H01J2237/31749

摘要： An apparatus is provided that precisely conduct ion beam etching to a sample having the properties of which easily change by electron beam irradiation with no loss of ease of operation and throughput. An apparatus includes an ion beam lens barrel and an electron beam lens barrel, which can observe or measure the conditions of a sample with an electron beam in the process of etching with an ion beam, wherein first, an observation image is obtained that includes the entire process area formed by secondary signals generated by an electron beam, secondly, an irradiation permit area and an irradiation inhibit area are defined in the observation image, and thirdly, electron beam irradiation is restricted only to the irradiation permit area.

摘要翻译： 提供了一种设备，其精确地将离子束蚀刻导入具有易于通过电子束照射而改变的性质的样品，而不会损失操作容易性和生产量。 一种装置包括离子束透镜镜筒和电子束透镜镜筒，其可以在用离子束蚀刻的过程中观察或测量具有电子束的样品的条件，其中首先获得包括 在观察图像中定义由电子束产生的二次信号形成的整个处理区域，其次，照射许可区域和照射禁止区域，第三，电子束照射仅限于照射许可区域。

公开(公告)号：US20090119807A1

公开(公告)日：2009-05-07

申请号：US12264750

申请日：2008-11-04

申请人： Xin Man ,  Kouji Iwasaki ,  Tatsuya Asahata

发明人： Xin Man ,  Kouji Iwasaki ,  Tatsuya Asahata

IPC分类号： G01N13/10

CPC分类号： H01J37/3056 ,  B82Y15/00 ,  G01N1/286 ,  H01J37/20 ,  H01J37/26 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/204 ,  H01J2237/206 ,  H01J2237/2067 ,  H01J2237/2802 ,  H01J2237/31745 ,  H01J2237/31749

摘要： Provided is a method of preparing a sample piece for a transmission electron microscope, the sample piece for a transmission electron microscope including a substantially planar finished surface which can be observed with the transmission electron microscope and a grabbing portion which microtweezers can grab without contacting the finished surface. The method of preparing a sample piece for a transmission electron microscope is characterized by including: a first step of cutting out the sample piece from a sample body Wa with a charged particle beam, the sample piece being coupled to the sample body at a coupling portion; a second step of grabbing with the microtweezers the grabbing portion of the sample piece with the finished surface of the sample piece cut out in the first step being covered with the microtweezers; a third step of detaching the sample piece grabbed with the microtweezers in the second step from the sample body by cutting the coupling portion with the charged particle beam with a grabbed state of the sample piece being maintained; and a fourth step of transferring and fixing with the microtweezers the sample piece detached in the third step onto a sample holder.

摘要翻译： 提供了一种制备透射电子显微镜样品的方法，用于透射电子显微镜的样品片，其包括可透射电子显微镜观察的基本上平面的成品表面，以及微型加工者可以在不接触成品的情况下抓取的抓取部分 表面。 制备透射电子显微镜样品的方法的特征在于包括：第一步骤，利用带电粒子束从样品体Wa切出样品片，样品片以耦合部分 ; 第二步骤是用微型加湿器抓住样品的抓取部分，其中在第一步骤中切出的样品的成品表面被微型加工机覆盖; 第三步骤，通过用保持样品的抓取状态的带电粒子束切割耦合部分，将样品从第二步骤中剥离出来; 以及第四步骤，用微型加工机将第三步骤中拆卸的样品片转移和固定到样品架上。

公开(公告)号：US07442942B2

公开(公告)日：2008-10-28

申请号：US11509520

申请日：2006-08-24

申请人： Haruo Takahashi ,  Toshiaki Fujii ,  Yutaka Ikku ,  Kouji Iwasaki ,  Yo Yamamoto

发明人： Haruo Takahashi ,  Toshiaki Fujii ,  Yutaka Ikku ,  Kouji Iwasaki ,  Yo Yamamoto

IPC分类号： H01J37/20

CPC分类号： H01J37/304 ,  G01N1/32 ,  H01J2237/31745 ,  H01J2237/31749

摘要： To include a focused ion beam apparatus fabricating a sliced specimen by processing a specimen as well as observing the sliced specimen, a scanning electron microscope observing the slice specimen, a gas-ion beam irradiation apparatus performing finishing processing by irradiating a gas-ion beam onto a surface of the sliced specimen, a specimen stage on which the sliced specimen is fixed and having at least one or more rotation axis, a specimen posture recognition means recognizing positional relation of the sliced specimen with respect to the specimen stage and a specimen stage control means controlling the specimen stage based on a specimen posture recognized by the posture recognition means and an installation angle of the gas-ion beam irradiation apparatus in order to allow an incident angle of the gas-ion beam with respect to the obverse or the reverse of the sliced specimen to be a desired value.

摘要翻译： 为了包括聚焦离子束装置，通过加工试样和观察切片试样来制造切片样品，观察切片试样的扫描电子显微镜，气相离子束照射装置，通过将气体离子束照射到 切片试样的表面，切片试样固定并具有至少一个以上的旋转轴的试样台，识别切片试样相对于试样台的位置关系的试样姿势识别装置和试样台控制 意味着基于由姿势识别装置识别的样本姿势和气体离子束照射装置的安装角度来控制样本台，以便允许气体离子束相对于正面或反向的入射角 切片样品为期望值。

公开(公告)号：US07404339B2

公开(公告)日：2008-07-29

申请号：US11182108

申请日：2005-07-15

申请人： Masanao Munekane ,  Kouji Iwasaki ,  Takashi Konno ,  Hiroki Hayashi

发明人： Masanao Munekane ,  Kouji Iwasaki ,  Takashi Konno ,  Hiroki Hayashi

IPC分类号： G01N1/00

CPC分类号： H01J37/20 ,  B25J7/00 ,  B25J15/12 ,  G01N1/32 ,  H01J2237/20264

摘要： A probe mechanism and a sample pick up mechanism of the invention are provided at an observing apparatus or an analyzing apparatus and characterized in including a tip member comprising a needle-like member brought into contact with a sample, including a driving electrostatic actuator and means for monitoring a change in an electrostatic capacitance between electrodes of the electrostatic actuator, and capable of sensing that the probe is brought into contact with a sample by the monitor.

摘要翻译： 本发明的探针机构和取样机构设置在观察装置或分析装置中，其特征在于，包括：尖端部件，包括与样品接触的针状部件，所述针状部件包括驱动静电致动器和用于 监测静电致动器的电极之间的静电电容的变化，并且能够感测到探针通过监视器与样品接触。

公开(公告)号：US07060397B2

公开(公告)日：2006-06-13

申请号：US10452541

申请日：2003-06-02

申请人： Yo Yamamoto ,  Kouji Iwasaki ,  Masamichi Oi

发明人： Yo Yamamoto ,  Kouji Iwasaki ,  Masamichi Oi

IPC分类号： G03F9/00 ,  G03C5/00

CPC分类号： G03F1/20 ,  G03F1/74 ,  G03F1/82 ,  H01J2237/31742 ,  Y10S430/143

摘要： A method of correcting a defective portion of an exposure window in a lithography mask, such as an EPL mask, includes a first step of irradiating a defective portion of the exposure window using a charge particle beam to perform correction processing, and a second step of irradiating another portion of the exposure window with the charged particle beam to eliminate attached matter therefrom, the attached matter consisting of particles ejected from the defective portion of the exposure window as a result of irradiation with the charged particle beam during the first step. The first step and the second step are sequentially repeated N times, wherein N is an integer of 2 or more, to thereby reduce the time needed for eliminating the attached matter.

摘要翻译： 一种校正诸如EPL掩模的光刻掩模中的曝光窗口的缺陷部分的方法包括：第一步骤，使用电荷粒子束照射曝光窗口的缺陷部分以执行校正处理，第二步骤 用带电粒子束照射曝光窗口的另一部分以从其中除去附着物，所述附着物质由在第一步骤期间被带电粒子束的照射而从曝光窗口的缺陷部分喷出的颗粒组成。 第一步骤和第二步骤依次重复N次，其中N为2以上的整数，从而减少了除去附着物所需的时间。

公开(公告)号：US06838685B1

公开(公告)日：2005-01-04

申请号：US10629217

申请日：2003-07-29

申请人： Toshio Kodama ,  Masakatsu Hasuda ,  Toshiaki Fujii ,  Kouji Iwasaki ,  Yasuhiko Sugiyama ,  Yasuyuki Takagi

发明人： Toshio Kodama ,  Masakatsu Hasuda ,  Toshiaki Fujii ,  Kouji Iwasaki ,  Yasuhiko Sugiyama ,  Yasuyuki Takagi

IPC分类号： G01N1/28 ,  G01N1/32 ,  H01J37/26 ,  H01J37/305 ,  H01J37/31 ,  H01J37/317

CPC分类号： H01J37/3056 ,  G01N1/32 ,  H01J2237/2007 ,  H01J2237/20214 ,  H01J2237/31745 ,  H01J2237/31749

摘要： An ion beam processing device has a sample holder for fixing a sample on which a section has been formed by irradiation of a specified focused ion beam from a surface side, and gas ion beam irradiation device for irradiating a gas ion beam to a region of the sample fixing using the holder member that contains the section to remove a damage layer on the section. The gas ion beam from the gas ion beam irradiation device irradiates the section from a rear surface side of the sample at a specified incident angle.

公开(公告)号：US06395347B1

公开(公告)日：2002-05-28

申请号：US08351093

申请日：1994-11-30

申请人： Tatsuya Adachi ,  Takashi Kaito ,  Yoshihiro Koyama ,  Kouji Iwasaki

发明人： Tatsuya Adachi ,  Takashi Kaito ,  Yoshihiro Koyama ,  Kouji Iwasaki

IPC分类号： H01J300

CPC分类号： H01J37/3056 ,  G01N1/32 ,  H01J2237/31744

摘要： A method for preparing a sample for observation, by the steps of: contacting a first predetermined area of the sample surface with an organic compound vapor while irradiating the first predetermined area with an ion beam to decompose the organic compound into a layer having a mask function, the layer covering the first predetermined area; and contacting a second predetermined area of the sample surface with an etching gas while irradiating the second predetermined area with an ion beam in order to remove material from the sample surface at the second predetermined area, wherein the second predetermined area includes at least part of the first predetermined area and the layer covering the first predetermined area prevents removal of material from the sample surface in the first predetermined area.

摘要翻译： 一种用于制备用于观察的样品的方法，包括以下步骤：使用离子束照射所述第一预定区域，使所述样品表面的第一预定区域与有机化合物蒸气接触，以将所述有机化合物分解成具有掩模功能的层 覆盖第一预定区域的层; 以及使所述样品表面的第二预定区域与蚀刻气体接触，同时用离子束照射所述第二预定区域，以便在所述第二预定区域从所述样品表面去除材料，其中所述第二预定区域包括所述第二预定区域的至少一部分 第一预定区域和覆盖第一预定区域的层防止在第一预定区域中从样品表面移除材料。

公开(公告)号：US08269194B2

公开(公告)日：2012-09-18

申请号：US12733089

申请日：2008-08-06

申请人： Takashi Kaito ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

发明人： Takashi Kaito ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

IPC分类号： H01J49/00

CPC分类号： H01J37/3056 ,  G01N1/286 ,  G01N1/32 ,  G03F1/74 ,  G03F1/84 ,  H01J37/08 ,  H01J37/3005 ,  H01J2237/0805 ,  H01J2237/0807 ,  H01J2237/31745

摘要： A composite focused ion beam device has a sample stage for supporting a sample, a first ion beam irradiation system that irradiates a first ion beam for processing the sample, and a second ion beam irradiation system that irradiates a second ion beam for processing or observing the sample. The first ion beam irradiation system has a liquid metal ion source that generates first ions for forming the first ion beam. The second ion beam irradiation system has a gas field ion source that generates second ions for forming the second ion beam. The first ion beam irradiated by the first ion beam irradiation system has a first beam diameter and the second ion beam irradiated by the second ion beam irradiation system has a second beam diameter smaller than the first beam diameter. The first and second ion beam irradiation systems are disposed relative to the sample stage so that axes of the first and second ion beams are orthogonal to a tilt axis of the sample stage.

摘要翻译： 复合聚焦离子束装置具有用于支撑样品的样品台，照射用于处理样品的第一离子束的第一离子束照射系统和照射第二离子束以用于处理或观察样品的第二离子束照射系统 样品。 第一离子束照射系统具有产生用于形成第一离子束的第一离子的液态金属离子源。 第二离子束照射系统具有产生用于形成第二离子束的第二离子的气体场离子源。 由第一离子束照射系统照射的第一离子束具有第一光束直径，并且由第二离子束照射系统照射的第二离子束具有小于第一光束直径的第二光束直径。 第一和第二离子束照射系统相对于样品台设置，使得第一和第二离子束的轴线垂直于样品台的倾斜轴。

公开(公告)号：US08191168B2

公开(公告)日：2012-05-29

申请号：US12264750

申请日：2008-11-04

申请人： Xin Man ,  Kouji Iwasaki ,  Tatsuya Asahata

发明人： Xin Man ,  Kouji Iwasaki ,  Tatsuya Asahata

IPC分类号： G01N13/10

CPC分类号： H01J37/3056 ,  B82Y15/00 ,  G01N1/286 ,  H01J37/20 ,  H01J37/26 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/204 ,  H01J2237/206 ,  H01J2237/2067 ,  H01J2237/2802 ,  H01J2237/31745 ,  H01J2237/31749

摘要： Provided is a method of preparing a sample piece for a transmission electron microscope, the sample piece for a transmission electron microscope including a substantially planar finished surface which can be observed with the transmission electron microscope and a grabbing portion which microtweezers can grab without contacting the finished surface. The method of preparing a sample piece for a transmission electron microscope is characterized by including: a first step of cutting out the sample piece from a sample body Wa with a charged particle beam, the sample piece being coupled to the sample body at a coupling portion; a second step of grabbing with the microtweezers the grabbing portion of the sample piece with the finished surface of the sample piece cut out in the first step being covered with the microtweezers; a third step of detaching the sample piece grabbed with the microtweezers in the second step from the sample body by cutting the coupling portion with the charged particle beam with a grabbed state of the sample piece being maintained; and a fourth step of transferring and fixing with the microtweezers the sample piece detached in the third step onto a sample holder.

摘要翻译： 提供了一种制备透射电子显微镜样品的方法，用于透射电子显微镜的样品片，其包括可透射电子显微镜观察的基本上平面的成品表面，以及微型加工者可以在不接触成品的情况下抓取的抓取部分 表面。 制备透射电子显微镜样品的方法的特征在于包括：第一步骤，利用带电粒子束从样品体Wa切出样品片，样品片以耦合部分 ; 第二步骤是用微型加湿器抓住样品的抓取部分，其中在第一步骤中切出的样品的成品表面被微型加工机覆盖; 第三步骤，通过用保持样品的抓取状态的带电粒子束切割耦合部分，将样品从第二步骤中剥离出来; 以及第四步骤，用微型加工机将第三步骤中拆卸的样品片转移和固定到样品架上。