发明授权
- 专利标题: Gated field effect devices
- 专利标题(中): 门控场效应器件
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申请号: US11253461申请日: 2005-10-19
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公开(公告)号: US07442977B2公开(公告)日: 2008-10-28
- 发明人: Cem Basceri , H. Montgomery Manning , Gurtej S. Sandhu , Kunal R. Parekh
- 申请人: Cem Basceri , H. Montgomery Manning , Gurtej S. Sandhu , Kunal R. Parekh
- 申请人地址: US ID Boise
- 专利权人: Micron Technology, Inc.
- 当前专利权人: Micron Technology, Inc.
- 当前专利权人地址: US ID Boise
- 代理机构: Wells St. John P.S.
- 主分类号: H01L27/108
- IPC分类号: H01L27/108
摘要:
This invention includes gated field effect devices, and methods of forming gated field effect devices. In one implementation, a gated field effect device includes a pair of source/drain regions having a channel region therebetween. A gate is received proximate the channel region between the source/drain regions. The gate has a gate width between the source/drain regions. A gate dielectric is received intermediate the channel region and the gate. The gate dielectric has at least two different regions along the width of the gate. The different regions are characterized by different materials which are effective to define the two different regions to have different dielectric constants k. Other aspects and implementations are contemplated.
公开/授权文献
- US20060038244A1 Gated field effect devices 公开/授权日:2006-02-23
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