Invention Grant
- Patent Title: Apparatus for measuring optical properties of tested optical system using interference
- Patent Title (中): 使用干涉测量被测光学系统的光学特性的装置
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Application No.: US11204439Application Date: 2005-08-15
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Publication No.: US07443515B2Publication Date: 2008-10-28
- Inventor: Seima Kato
- Applicant: Seima Kato
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon USA Inc IP Division
- Priority: JP2004-255780 20040902
- Main IPC: G01B11/02
- IPC: G01B11/02
Abstract:
A measuring apparatus for measuring the optical properties of an optical system including a mask with a slit and a window, upon which different light beams are focused to derive an interference pattern. The interference pattern can be used to obtain optical properties of the optical system.
Public/Granted literature
- US20060044569A1 Apparatus for measuring optical properties of tested optical system using interference Public/Granted day:2006-03-02
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