发明授权
- 专利标题： Illumination system particularly for microlithography
- 专利标题（中）： 照明系统特别适用于微光刻
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申请号： US11345880申请日： 2006-02-02
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公开(公告)号： US07443948B2公开(公告)日： 2008-10-28
- 发明人: Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
- 申请人： Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
- 申请人地址： DE Oberkochen
- 专利权人： Carl Zeiss SMT AG
- 当前专利权人： Carl Zeiss SMT AG
- 当前专利权人地址： DE Oberkochen
- 代理机构： Ohlandt, Greeley, Ruggiero & Perle, L.L.P.
- 优先权： DE19819898 19980505; DE19903807 19990202; DE29902108 19990208; WOPCT/EP00/07258 20000728
- 主分类号： G21K5/04
- IPC分类号： G21K5/04
摘要：
There is provided an illumination system. the illumination system includes (a) a source of light having a wavelength of less than or equal to 193 nm, and (b) an optical element in a path of the light, having a first raster element, a second raster element, a third raster element and a fourth raster element situated thereon. The second raster element is adjacent to the first raster element, and located a first distance from the first raster element. The fourth raster element is adjacent to the third raster element, and located a second distance from the third raster element. The second distance is different from the first distance.
公开/授权文献
- US20060245540A1 Illumination system particularly for microlithography 公开/授权日：2006-11-02
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