Invention Grant
- Patent Title: Illumination system particularly for microlithography
- Patent Title (中): 照明系统特别适用于微光刻
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Application No.: US11345880Application Date: 2006-02-02
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Publication No.: US07443948B2Publication Date: 2008-10-28
- Inventor: Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
- Applicant: Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT AG
- Current Assignee: Carl Zeiss SMT AG
- Current Assignee Address: DE Oberkochen
- Agency: Ohlandt, Greeley, Ruggiero & Perle, L.L.P.
- Priority: DE19819898 19980505; DE19903807 19990202; DE29902108 19990208; WOPCT/EP00/07258 20000728
- Main IPC: G21K5/04
- IPC: G21K5/04

Abstract:
There is provided an illumination system. the illumination system includes (a) a source of light having a wavelength of less than or equal to 193 nm, and (b) an optical element in a path of the light, having a first raster element, a second raster element, a third raster element and a fourth raster element situated thereon. The second raster element is adjacent to the first raster element, and located a first distance from the first raster element. The fourth raster element is adjacent to the third raster element, and located a second distance from the third raster element. The second distance is different from the first distance.
Public/Granted literature
- US20060245540A1 Illumination system particularly for microlithography Public/Granted day:2006-11-02
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