发明授权
- 专利标题: Electron source producing apparatus and method
- 专利标题(中): 电子源产生装置及方法
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申请号: US11000986申请日: 2004-12-02
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公开(公告)号: US07445535B2公开(公告)日: 2008-11-04
- 发明人: Kazumasa Takatsu , Shigeto Kamata
- 申请人: Kazumasa Takatsu , Shigeto Kamata
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Fitzpatrick, Cella, Harper & Scinto
- 优先权: JP2003-413470 20031211
- 主分类号: H01J9/00
- IPC分类号: H01J9/00 ; H01L21/00
摘要:
An electron source producing apparatus for forming an electron-emission part on a conductive member disposed on a substrate in an atmosphere containing a desired gas. The apparatus includes a container for forming a hermetic atmosphere between the container and a surface of the substrate on which the conductive member is formed. The container has a gas inlet and a gas outlet. A diffusing member is for diffusing an introduced gas, and is disposed between the gas inlet and the surface of the substrate. A resisting member provides exhaust resistance, and is disposed between the gas outlet and the surface of the substrate and is separated from the gas outlet. The resisting member is disposed closer to the surface of the substrate than is the diffusing member.
公开/授权文献
- US20050127812A1 Electron source producing apparatus and method 公开/授权日:2005-06-16
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