Invention Grant
- Patent Title: Photothermographic material, development method and thermal development device thereof
- Patent Title (中): 光热照相材料，其开发方法和热显影装置
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Application No.: US11143563Application Date: 2005-06-02
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Publication No.: US07445884B2Publication Date: 2008-11-04
- Inventor: Hiroyuki Yanagisawa
- Applicant: Hiroyuki Yanagisawa
- Applicant Address: JP Tokyo
- Assignee: Konica Minolta Medical & Graphic, Inc.
- Current Assignee: Konica Minolta Medical & Graphic, Inc.
- Current Assignee Address: JP Tokyo
- Agency: Frishauf, Holtz, Goodman & Chick, P.C.
- Priority: JP2004-170869 20040609
- Main IPC: G03C5/16
- IPC: G03C5/16 ; G03B27/32 ; B41J2/435
Abstract:
A thermal development device including: a thermal development section for heating to develop a latent image formed on a light-sensitive surface of a photothermographic material; a cooling section for cooling the photothermographic material passed the thermal development section under a condition that a cooling rate for a light-insensitive surface of the photothermographic material is faster than the cooling rate for the light-sensitive surface of the photothermographic material; and a conveyance section in which the photothermographic material is conveyed via the thermal development section and the cooling section, and the length of the conveyance path that passes the cooling section is not more than 1.5 times the length of the conveyance path that passes the thermal development section.
Public/Granted literature
- US20060003272A1 Photothermographic material, development method and thermal development device thereof Public/Granted day:2006-01-05
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