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US07449067B2 Method and apparatus for filling vias 有权
填充通孔的方法和装置

Method and apparatus for filling vias
Abstract:
A method for filling vias, and in particular initially blind vias, in a wafer, and various apparatus for performing the method, comprising evacuating air from the vias; trapping at least a portion of the wafer and a paste for filling the vias between two surfaces; and pressurizing the paste to fill the vias.
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