Invention Grant
- Patent Title: EUV light source
- Patent Title (中): EUV光源
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Application No.: US11647024Application Date: 2006-12-27
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Publication No.: US07449704B2Publication Date: 2008-11-11
- Inventor: Igor V. Fomenkov , Alexander I. Ershov
- Applicant: Igor V. Fomenkov , Alexander I. Ershov
- Applicant Address: US CA San Diego
- Assignee: Cymer, Inc.
- Current Assignee: Cymer, Inc.
- Current Assignee Address: US CA San Diego
- Agent William C. Cray
- Main IPC: H01J35/20
- IPC: H01J35/20
Abstract:
An EUV light source apparatus and method for producing EUV light, which includes a plasma generation chamber for generating EUV plasma; an EUV light collector having a reflective portion irradiated by EUV light produced in the EUV plasma; a target sample having reflective portion comprised of the same materials as the EUV light collector reflective portion; a first EUV detector for detecting EUV light produced in the EUV plasma; and a second EUV detector for detecting EUV light reflected from the target sample.
Public/Granted literature
- US20080017801A1 EUV light source Public/Granted day:2008-01-24
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