发明授权
- 专利标题： EUV light source
- 专利标题（中）： EUV光源
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申请号： US11647024申请日： 2006-12-27
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公开(公告)号： US07449704B2公开(公告)日： 2008-11-11
- 发明人: Igor V. Fomenkov , Alexander I. Ershov
- 申请人： Igor V. Fomenkov , Alexander I. Ershov
- 申请人地址： US CA San Diego
- 专利权人： Cymer, Inc.
- 当前专利权人： Cymer, Inc.
- 当前专利权人地址： US CA San Diego
- 代理商 William C. Cray
- 主分类号： H01J35/20
- IPC分类号： H01J35/20
摘要：
An EUV light source apparatus and method for producing EUV light, which includes a plasma generation chamber for generating EUV plasma; an EUV light collector having a reflective portion irradiated by EUV light produced in the EUV plasma; a target sample having reflective portion comprised of the same materials as the EUV light collector reflective portion; a first EUV detector for detecting EUV light produced in the EUV plasma; and a second EUV detector for detecting EUV light reflected from the target sample.
公开/授权文献
- US20080017801A1 EUV light source 公开/授权日：2008-01-24
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