Invention Grant
- Patent Title: Objective-lens protector, objective-lens treatment method, and objective-lens cleaner
- Patent Title (中): 物镜保护器,物镜处理方法和物镜清洁器
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Application No.: US11400200Application Date: 2006-04-10
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Publication No.: US07450325B2Publication Date: 2008-11-11
- Inventor: Hideto Yamashita , Hiroya Fukuyama , Tadashi Hirata
- Applicant: Hideto Yamashita , Hiroya Fukuyama , Tadashi Hirata
- Applicant Address: JP Tokyo
- Assignee: Olympus Corporation
- Current Assignee: Olympus Corporation
- Current Assignee Address: JP Tokyo
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: JP2005-115565 20050413; JP2005-127139 20050425
- Main IPC: G02B7/02
- IPC: G02B7/02 ; G02B23/16 ; G03B17/00

Abstract:
The present invention makes an objective lens easier to handle during disinfection or sterilization and protects the objective lens during, for example, transport, storage, or handling. The present invention provides an objective-lens protector including a substantially ring-shaped mounting portion surrounding a circumference of an objective lens, the mounting portion detachably mounted on the objective lens such that a threaded mount formed on the objective lens for mounting the objective lens to a microscope main body is exposed; a protecting member fixed to the mounting portion, extending substantially along the entire length of the objective lens mounted on the mounting portion, and arranged at a distance outwardly in a radial direction of the objective lens so as to surround the objective lens; and a locking mechanism provided on the mounting portion to prevent the objective lens from moving relative to the mounting portion in a circumferential direction.
Public/Granted literature
- US20060250928A1 Objective-lens protector, objective-lens treatment method, and objective-lens cleaner Public/Granted day:2006-11-09
Information query
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B7/00 | 光学元件的安装、调整装置或不漏光连接 |
G02B7/02 | .用于透镜 |