发明授权
US07455824B2 Amorphous carbon, amorphous-carbon coated member, and process for forming amorphous carbon film
有权
无定形碳,无定形碳涂层构件和形成无定形碳膜的方法
- 专利标题: Amorphous carbon, amorphous-carbon coated member, and process for forming amorphous carbon film
- 专利标题(中): 无定形碳,无定形碳涂层构件和形成无定形碳膜的方法
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申请号: US11002125申请日: 2004-12-03
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公开(公告)号: US07455824B2公开(公告)日: 2008-11-25
- 发明人: Kazuyuki Nakanishi , Tadashi Oshima , Hideo Hasegawa , Hiroyuki Mori , Takashi Iseki , Hideo Tachikawa , Munehisa Matsui
- 申请人: Kazuyuki Nakanishi , Tadashi Oshima , Hideo Hasegawa , Hiroyuki Mori , Takashi Iseki , Hideo Tachikawa , Munehisa Matsui
- 申请人地址: JP Aichi-gun
- 专利权人: Kabushiki Kaisha Toyota Chuo Kenkyusho
- 当前专利权人: Kabushiki Kaisha Toyota Chuo Kenkyusho
- 当前专利权人地址: JP Aichi-gun
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- 优先权: JP2003-406306 20031204; JP2004-340860 20041125
- 主分类号: B32B9/00
- IPC分类号: B32B9/00
摘要:
To provide a soft amorphous carbon exhibiting a low elastic modulus, an amorphous-carbon coated member provided with a coated film comprising the amorphous carbon, and a process for forming an amorphous carbon film. The amorphous carbon comprises carbon as a major component and hydrogen in an amount of from more than 30 atomic % to 60 atomic % or less, and exhibits an elastic modulus of from 40 or more to 150 GPa or less. Moreover, the amorphous-carbon coated member comprises a conductive substrate, and a coated film fixed on at least a part of a surface of the substrate and composed of the amorphous carbon. In addition, in a process for forming the amorphous-carbon coated film, an amorphous carbon film is formed on a surface of conductive substrates by a plasma CVD method. Not only a plurality of the substrates are disposed on a substrate holder, which is disposed in a film-forming furnace and is connected with a negative electrode, in such a state that they face to each other, but also a processing gas pressure and a plasma power source are operated so as to overlap negative glows of the neighboring two substrates.