Invention Grant
- Patent Title: Method for detecting particles and defects and inspection equipment thereof
- Patent Title (中): 检测颗粒和缺陷的方法及其检测设备
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Application No.: US11822330Application Date: 2007-07-05
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Publication No.: US07456948B2Publication Date: 2008-11-25
- Inventor: Takahiro Togashi , Shigeru Matsui
- Applicant: Takahiro Togashi , Shigeru Matsui
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2006-187351 20060707
- Main IPC: G01N21/88
- IPC: G01N21/88 ; G01N21/86

Abstract:
A method and equipment which includes an illustrated-spot illumination-distribution data table for storing an illumination distribution within an illustrated spot and which calculates a coordinate position for a particle or a defect and the diameter of the particle on the basis of detection light intensity data about the particle or defect and the illustrated-spot illumination-distribution data table. Thus, even when the illumination distribution within the illustrated spot based on an actual illumination optical system is not a Gaussian distribution, the calculation of the particle diameter of the detected particle or defect and the calculation of a coordinate position on the surface of an object to be inspected can be attained with an increased accuracy.
Public/Granted literature
- US20080007725A1 Method for detecting particles and defects and inspection equipment thereof Public/Granted day:2008-01-10
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