Invention Grant
- Patent Title: Method and system for cleaning a photomask
- Patent Title (中): 清洁光掩模的方法和系统
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Application No.: US11671570Application Date: 2007-02-06
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Publication No.: US07462248B2Publication Date: 2008-12-09
- Inventor: Chih-Cheng Chiu , Ching-Yu Chang
- Applicant: Chih-Cheng Chiu , Ching-Yu Chang
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: B08B3/04
- IPC: B08B3/04
Abstract:
A method for cleaning a photomask includes cleaning the photomask with a chemical cleaner, introducing a solution to the photomask, the solution is configured to react with residuals generated from the chemical cleaner to form insoluble precipitates, and rinsing the photomask with a fluid to remove the insoluble precipitates from the photomask.
Public/Granted literature
- US20080185021A1 Method and System For Cleaning A Photomask Public/Granted day:2008-08-07
Information query
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