发明授权
- 专利标题： Exposure apparatus, and device manufacturing method
- 专利标题（中）： 曝光装置和装置制造方法
-
申请号： US11762286申请日： 2007-06-13
-
公开(公告)号： US07463335B2公开(公告)日： 2008-12-09
- 发明人: Yoshikazu Miyajima , Takashi Meguro
- 申请人： Yoshikazu Miyajima , Takashi Meguro
- 申请人地址： JP Tokyo
- 专利权人： Canon Kabuhsiki Kaisha
- 当前专利权人： Canon Kabuhsiki Kaisha
- 当前专利权人地址： JP Tokyo
- 代理机构： Fitzpatrick, Cella, Harper & Scinto
- 优先权： JP2004-306054 20041020
- 主分类号： G03B27/72
- IPC分类号： G03B27/72 ; G03B27/42
摘要：
An exposure apparatus for illuminating an original through an illumination system and for transferring a pattern of the original onto a substrate. The apparatus includes a movable element having a blade, the blade being provided in the illumination system and blocking at least a portion of illumination light, a stator configured to relatively move the movable element, and a resilient supporting member configured to resiliently support the stator without contacting the stator.
公开/授权文献
- US20070285648A1 EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 公开/授权日：2007-12-13
信息查询
