Invention Grant
- Patent Title: Method of forming suspended structure
- Patent Title (中): 形成悬浮结构的方法
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Application No.: US11736593Application Date: 2007-04-18
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Publication No.: US07465601B2Publication Date: 2008-12-16
- Inventor: Yu-Fu Kang , Chen-Hsiung Yang
- Applicant: Yu-Fu Kang , Chen-Hsiung Yang
- Applicant Address: TW Yang-Mei, Taoyuan Hsien
- Assignee: Touch Micro-System Technology Inc.
- Current Assignee: Touch Micro-System Technology Inc.
- Current Assignee Address: TW Yang-Mei, Taoyuan Hsien
- Agent Winston Hsu
- Priority: TW95146271A 20061211
- Main IPC: H01L21/62
- IPC: H01L21/62

Abstract:
A method of forming a suspended structure is disclosed. Initially, a substrate is provided. A patterned first sacrificial layer and a patterned second sacrificial layer are formed on a front surface of the substrate. The second sacrificial layer has an opening exposing a part of the substrate and a part of the first sacrificial layer. A structural layer is formed covering the abovementioned sacrificial layers. Thereafter, a lift-off process is performed to remove the second sacrificial layer and define the pattern of the structural layer. A first etching process is performed on a back surface of the substrate utilizing the first sacrificial layer as an etching barrier and a through hole is formed under the first sacrificial layer. A second etching layer is performed to remove the first sacrificial layer and a suspended structure is thereby formed.
Public/Granted literature
- US20080138923A1 METHOD OF FORMING SUSPENDED STRUCTURE Public/Granted day:2008-06-12
Information query
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