Invention Grant
- Patent Title: Semiconductor device in which an injector region is isolated from a substrate
- Patent Title (中): 注射器区域与衬底隔离的半导体器件
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Application No.: US11321051Application Date: 2005-12-30
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Publication No.: US07465964B2Publication Date: 2008-12-16
- Inventor: Florin Udrea
- Applicant: Florin Udrea
- Applicant Address: GB Cambridge
- Assignee: Cambridge Semiconductor Limited
- Current Assignee: Cambridge Semiconductor Limited
- Current Assignee Address: GB Cambridge
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: H01L29/735
- IPC: H01L29/735

Abstract:
A high voltage/power semiconductor device has a substrate, an insulating layer on the substrate, and a semiconductor layer on the insulating layer. Low and high voltage terminals are connected to the semiconductor layer. The device has a control terminal. The semiconductor layer includes a drift region and a relatively highly doped injector region between the drift region and the high voltage terminal. The device has a relatively highly doped region in electrical contact with the highly doped injector region and the high voltage terminal and forming a semiconductor junction with the substrate. The combination of the insulating layer and the relatively highly doped region of the first conductivity type effectively isolate the highly doped injector region from the substrate.
Public/Granted literature
- US20070158678A1 Semiconductor device and method of forming a semiconductor device Public/Granted day:2007-07-12
Information query
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