发明授权
- 专利标题： Transforming metrology data from a semiconductor treatment system using multivariate analysis
- 专利标题（中）： 使用多变量分析从半导体处理系统转换计量学数据
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申请号： US11349773申请日： 2006-02-07
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公开(公告)号： US07467064B2公开(公告)日： 2008-12-16
- 发明人: Vi Vuong , Junwei Bao , Yan Chen , Weichert Heiko , Sebastien Egret
- 申请人： Vi Vuong , Junwei Bao , Yan Chen , Weichert Heiko , Sebastien Egret
- 申请人地址： US CA Santa Clara
- 专利权人： Timbre Technologies, Inc.
- 当前专利权人： Timbre Technologies, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Morrison & Foerster LLP
- 主分类号： G06F15/00
- IPC分类号： G06F15/00
摘要：
Metrology data from a semiconductor treatment system is transformed using multivariate analysis. In particular, a set of metrology data measured or simulated for one or more substrates treated using the treatment system is obtained. One or more essential variables for the obtained set of metrology data is determined using multivariate analysis. A first metrology data measured or simulated for one or more substrates treated using the treatment system is obtained. The first obtained metrology data is not one of the metrology data in the set of metrology data earlier obtained. The first metrology data is transformed into a second metrology data using the one or more of the determined essential variables.
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