- 专利标题： Fuse/anti-fuse structure and methods of making and programming same
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申请号： US11491721申请日： 2006-07-24
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公开(公告)号： US07470929B2公开(公告)日： 2008-12-30
- 发明人: Louis C. Hsu , Rajiv V. Joshi , Jack Allan Mandelman , Chih-Chao Yang
- 申请人： Louis C. Hsu , Rajiv V. Joshi , Jack Allan Mandelman , Chih-Chao Yang
- 申请人地址： US NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： US NY Armonk
- 代理机构： Ryan, Mason & Lewis, LLP
- 主分类号： H01L29/10
- IPC分类号： H01L29/10
摘要：
Techniques are provided for fuse/anti-fuse structures, including an inner conductor structure, an insulating layer spaced outwardly of the inner conductor structure, an outer conductor structure disposed outwardly of the insulating layer, and a cavity-defining structure that defines a cavity, with at least a portion of the cavity-defining structure being formed from at least one of the inner conductor structure, the insulating layer, and the outer conductor structure. Methods of making and programming the fuse/anti-fuse structures are also provided.
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