Invention Grant
US07480129B2 Detachable electrostatic chuck for supporting a substrate in a process chamber
有权
用于在处理室中支撑基板的可拆卸静电卡盘
- Patent Title: Detachable electrostatic chuck for supporting a substrate in a process chamber
- Patent Title (中): 用于在处理室中支撑基板的可拆卸静电卡盘
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Application No.: US11221169Application Date: 2005-09-07
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Publication No.: US07480129B2Publication Date: 2009-01-20
- Inventor: Karl Brown , Semyon Sherstinsky , Wei W. Wang , Cheng-Hsiung Tsai , Vineet Mehta , Allen Lau , Steve Sansoni
- Applicant: Karl Brown , Semyon Sherstinsky , Wei W. Wang , Cheng-Hsiung Tsai , Vineet Mehta , Allen Lau , Steve Sansoni
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Janah & Associates, P.C.
- Main IPC: H01L21/683
- IPC: H01L21/683

Abstract:
A detachable electrostatic chuck can be attached to a pedestal in a process chamber. The electrostatic chuck has an electrostatic puck comprising a dielectric covering at least one electrode and a frontside surface to receive a substrate. A backside surface of the chuck has a central protrusion that can be a D-shaped mesa to facilitate alignment with a mating cavity in the pedestal. The protrusion can also have asymmetrically offset apertures, which further assist alignment, and also serve to receive electrode terminal posts and a gas tube. A heat transfer plate having an embedded heat transfer fluid channel is spring loaded on the pedestal to press against the chuck for good heat transfer.
Public/Granted literature
- US20060002053A1 Detachable electrostatic chuck for supporting a substrate in a process chamber Public/Granted day:2006-01-05
Information query
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