发明授权
US07480571B2 Apparatus and methods for improving the stability of RF power delivery to a plasma load
有权
用于提高RF功率输送到等离子体负载的稳定性的装置和方法
- 专利标题： Apparatus and methods for improving the stability of RF power delivery to a plasma load
- 专利标题（中）： 用于提高RF功率输送到等离子体负载的稳定性的装置和方法
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申请号： US10966549申请日： 2004-10-15
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公开(公告)号： US07480571B2公开(公告)日： 2009-01-20
- 发明人: Arthur M. Howald , Andras Kuthi , Andrew D. Bailey, III
- 申请人： Arthur M. Howald , Andras Kuthi , Andrew D. Bailey, III
- 申请人地址： US CA Fremont
- 专利权人： Lam Research Corporation
- 当前专利权人： Lam Research Corporation
- 当前专利权人地址： US CA Fremont
- 代理机构： IP Strategy Group, P.C.
- 主分类号： C23F1001/00
- IPC分类号： C23F1001/00
摘要：
Methods for improving the stability of RF power delivery to a plasma load are disclosed. The method includes adding an RF resistor and/or a power attenuator at one of many specific locations in the RF power system to lower the impedance derivatives while keeping the matching circuit substantially in tune with the RF transmission line.
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