发明授权
US07485505B2 Thin-film transistor, method for manufacturing thin-film transistor, and display using thin-film transistors
失效
薄膜晶体管,薄膜晶体管的制造方法以及使用薄膜晶体管的显示器
- 专利标题: Thin-film transistor, method for manufacturing thin-film transistor, and display using thin-film transistors
- 专利标题(中): 薄膜晶体管,薄膜晶体管的制造方法以及使用薄膜晶体管的显示器
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申请号: US11855755申请日: 2007-09-14
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公开(公告)号: US07485505B2公开(公告)日: 2009-02-03
- 发明人: Yoshiaki Nakazaki , Genshiro Kawachi , Terunori Warabisako , Masakiyo Matsumura
- 申请人: Yoshiaki Nakazaki , Genshiro Kawachi , Terunori Warabisako , Masakiyo Matsumura
- 申请人地址: JP Yokohama-shi
- 专利权人: Advanced LCD Technologies Development Center Co., Ltd.
- 当前专利权人: Advanced LCD Technologies Development Center Co., Ltd.
- 当前专利权人地址: JP Yokohama-shi
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- 优先权: JP2005-195781 20050705; JP2005-196859 20050705
- 主分类号: H01L21/84
- IPC分类号: H01L21/84
摘要:
The present invention provides a thin-film transistor offering a higher electron (or hole) mobility, a method for manufacturing the thin-film transistor, and a display using the thin-film transistor. The present invention provides a thin-film transistor having a source region, a channel region, and a drain region in a semiconductor thin film with a crystal grown in a horizontal direction, the thin-film transistor having a gate insulating film and a gate electrode over the channel region, wherein a drain edge of the drain region which is adjacent to the channel region is formed in the vicinity of a crystal growth end position.
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