Invention Grant
- Patent Title: Plasma display device and method of preparing phosphor
- Patent Title (中): 等离子体显示装置及其制备方法
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Application No.: US10517262Application Date: 2004-02-18
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Publication No.: US07486010B2Publication Date: 2009-02-03
- Inventor: Kazuhiko Sugimoto , Junichi Hibino , Masaki Aoki , Yoshinori Tanaka , Hiroshi Setoguchi
- Applicant: Kazuhiko Sugimoto , Junichi Hibino , Masaki Aoki , Yoshinori Tanaka , Hiroshi Setoguchi
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2003-042864 20030220
- International Application: PCT/JP2004/001761 WO 20040218
- International Announcement: WO2004/075237 WO 20040902
- Main IPC: C09K11/08
- IPC: C09K11/08 ; C09K11/64 ; H01J17/49

Abstract:
In a phosphor whose host crystal is constituted of an oxide, a method of preparing the phosphor where the oxygen deficiencies in the phosphor are not many, and a plasma display device using the same are provided. After processes of weighing, mixing and filling powders of the phosphor, a process for firing in a reducing atmosphere and a process for firing in an oxidizing atmosphere after the last reducing atmosphere process are provided. In addition, a firing temperature in the oxidizing atmosphere process is not less than 600° C. and not more than 1000° C.
Public/Granted literature
- US20050225520A1 Plasma display device and method of preparing phosphor Public/Granted day:2005-10-13
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