发明授权
- 专利标题: Offset correction methods and arrangement for positioning and inspecting substrates
- 专利标题(中): 用于定位和检查基板的偏移校正方法和布置
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申请号: US11612370申请日: 2006-12-18
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公开(公告)号: US07486878B2公开(公告)日: 2009-02-03
- 发明人: Jack Chen , Andrew D Bailey, III , Ben Mooring , Stephen J. Cain
- 申请人: Jack Chen , Andrew D Bailey, III , Ben Mooring , Stephen J. Cain
- 申请人地址: US CA Fremont
- 专利权人: Lam Research Corporation
- 当前专利权人: Lam Research Corporation
- 当前专利权人地址: US CA Fremont
- 代理机构: IP Strategy Group, P.C.
- 主分类号: G03B15/00
- IPC分类号: G03B15/00 ; G03B15/03 ; G03B17/00 ; G01R13/26
摘要:
A bevel inspection module for capturing images of a substrate is provided. The module includes a rotational motor, which is attached to a substrate chuck and is configured to rotate the substrate chuck thereby allowing the substrate to revolve. The module further includes a camera and an optic enclosure, which is attached to the camera and is configured to rotate, enabling light to be directed toward the substrate. The camera is mounted from a camera mount, which is configured to enable the camera to rotate on a 180 degree plane allowing the camera to capture images of at least one of a top view, a bottom view, and a side view of the substrate. The module yet also includes a backlight arrangement, which is configured to provide illumination to the substrate, thereby enabling the camera to capture the images, which shows contrast between the substrate and a background.
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