Invention Grant
- Patent Title: Plasma-assisted gas production
- Patent Title (中): 等离子体辅助天然气生产
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Application No.: US10513220Application Date: 2003-05-07
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Publication No.: US07497922B2Publication Date: 2009-03-03
- Inventor: Satyendra Kumar , Devendra Kumar
- Applicant: Satyendra Kumar , Devendra Kumar
- Applicant Address: US MA N. Billerica
- Assignee: BTU International, Inc.
- Current Assignee: BTU International, Inc.
- Current Assignee Address: US MA N. Billerica
- Agency: Weingarten, Schurgin, Gagnebin & Lebovici LLP
- International Application: PCT/US03/14134 WO 20030507
- International Announcement: WO03/096369 WO 20031120
- Main IPC: H05H1/00
- IPC: H05H1/00

Abstract:
Methods and apparatus are provided for plasma-assisted gas production. In one embodiment, a gas, which includes at least one atomic or molecular species, can flow into a cavity (305). The gas can be subjected to electromagnetic radiation having a frequency less than about 333 GHz (optionally in the presence of a plasma catalyst) such that a plasma (310) forms in the cavity (305). A filter (315) capable of passing the atomic or molecular species, but preventing others from passing, can be in fluid communication with the cavity (305). In this way, the selected species can be extracted and collected, for storage or immediate use.
Public/Granted literature
- US20050253529A1 Plasma-assisted gas production Public/Granted day:2005-11-17
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