发明授权
- 专利标题: Lithographic apparatus and device manufacturing method
- 专利标题(中): 平版印刷设备和器件制造方法
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申请号: US11202195申请日: 2005-08-12
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公开(公告)号: US07505116B2公开(公告)日: 2009-03-17
- 发明人: Jan Evert Van Der Werf , George Arie Jan Fockert , Hans Van Der Laan
- 申请人: Jan Evert Van Der Werf , George Arie Jan Fockert , Hans Van Der Laan
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 优先权: EP02255002 20020716
- 主分类号: G03B27/54
- IPC分类号: G03B27/54 ; G03B27/42 ; G01B11/00
摘要:
A reflector alignment system uses an alignment beam propagating through a projection system that includes a mirror group to measure the apparent relative positions of two reference marks fixed to a reference frame on opposite sides of the projection system. Any movement of mirrors in the projection system will be detected as a shift in the apparent position of the reference marks.
公开/授权文献
- US20050280795A1 Lithographic apparatus and device manufacturing method 公开/授权日:2005-12-22