发明授权
- 专利标题： Device having a getter structure and a photomask
- 专利标题（中）： 具有吸气结构和光掩模的装置
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申请号： US10689819申请日： 2003-10-20
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公开(公告)号： US07508132B2公开(公告)日： 2009-03-24
- 发明人: Chien-Hua Chen , James C. McKinnell , John Liebeskind
- 申请人： Chien-Hua Chen , James C. McKinnell , John Liebeskind
- 申请人地址： US TX Houston
- 专利权人： Hewlett-Packard Development Company, L.P.
- 当前专利权人： Hewlett-Packard Development Company, L.P.
- 当前专利权人地址： US TX Houston
- 代理商 Donald J Coulman
- 主分类号： H01J61/26
- IPC分类号： H01J61/26
摘要：
A device including a substrate, a getter structure coupled to the substrate, and a photomask disposed over the getter structure. The photomask has a substantially transmissive and a substantially non-transmissive region. The substantially transmissive region substantially aligns with the getter structure.
公开/授权文献
- US20050085052A1 Device having a getter 公开/授权日：2005-04-21
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