发明授权
- 专利标题: Nitride semiconductor laser element
- 专利标题(中): 氮化物半导体激光元件
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申请号: US11702625申请日: 2007-02-06
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公开(公告)号: US07515621B2公开(公告)日: 2009-04-07
- 发明人: Shigetoshi Ito , Yuhzoh Tsuda , Yoshihiro Ueta
- 申请人: Shigetoshi Ito , Yuhzoh Tsuda , Yoshihiro Ueta
- 申请人地址: JP Osaka
- 专利权人: Sharp Kabushiki Kaisha
- 当前专利权人: Sharp Kabushiki Kaisha
- 当前专利权人地址: JP Osaka
- 代理机构: Harness, Dickey & Pierce, P.L.C.
- 优先权: JP2006-030442 20060208
- 主分类号: H01S5/00
- IPC分类号: H01S5/00
摘要:
A nitride semiconductor laser element includes a lower clad layer, a lower adjacent layer, a quantum well active layer, an upper adjacent layer and an upper clad layer in this order. The quantum well active layer includes a plurality of well layers formed of undoped InGaN, and an undoped barrier layer sandwiched between the well layers. The barrier layer includes a first layer formed of InGaN, a second layer formed of GaN, and a third layer formed of InGaN. The In composition ratio of the first layer and the In composition ratio of the third layer are less than half the In composition ratio of the well layer.
公开/授权文献
- US20070297476A1 Nitride semiconductor laser element 公开/授权日:2007-12-27
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