发明授权
- 专利标题： Method for manufacturing porous structure and method for forming pattern
- 专利标题（中）： 制造多孔结构的方法及其形成方法
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申请号： US11455916申请日： 2006-06-20
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公开(公告)号： US07517466B2公开(公告)日： 2009-04-14
- 发明人: Koji Asakawa , Toshiro Hiraoka , Yoshihiro Akasaka , Yasuyuki Hotta
- 申请人： Koji Asakawa , Toshiro Hiraoka , Yoshihiro Akasaka , Yasuyuki Hotta
- 申请人地址： JP Kawasaki-shi
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JP Kawasaki-shi
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- 优先权： JP11-159479 19990607; JP11-262326 19990916; JP2000-169263 20000606
- 主分类号： C08J9/26
- IPC分类号： C08J9/26
摘要：
A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer chains constituting the block copolymer or graft copolymer, the ratio between N/(Nc−No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit.