发明授权
- 专利标题： Photoresist polymers
- 专利标题（中）： 光致抗蚀剂聚合物
-
申请号： US11300658申请日： 2005-12-12
-
公开(公告)号： US07517634B2公开(公告)日： 2009-04-14
- 发明人: Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
- 申请人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
- 申请人地址： JP Tokyo
- 专利权人： JSR Corporation
- 当前专利权人： JSR Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Fulbright & Jaworski LLP
- 代理商 Scott D. Rothenberger
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; G03F7/004
摘要：
The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
公开/授权文献
- US20060217519A1 Photoresist polymers 公开/授权日：2006-09-28
信息查询
