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公开(公告)号：US07399806B2
公开(公告)日：2008-07-15
申请号：US11734474
申请日：2007-04-12
申请人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
发明人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
CPC分类号： C08F220/30 , C08F2/38 , C08F20/30 , C08F220/18 , C08F293/005 , G03F7/0046 , G03F7/0397
摘要： The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
摘要翻译： 本发明涉及通过活性自由基聚合技术制备光致抗蚀剂聚合物。 用作单体体积大的酯单体作为聚合组分。 链转移剂的使用包括在聚合工艺条件中。 描述了包含杂原子的聚合物末端基团的切割。
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公开(公告)号：US07250475B2
公开(公告)日：2007-07-31
申请号：US10877110
申请日：2004-06-25
申请人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
发明人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
CPC分类号： C08F220/30 , C08F2/38 , C08F20/30 , C08F220/18 , C08F293/005 , G03F7/0046 , G03F7/0397
摘要： The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
摘要翻译： 本发明涉及通过活性自由基聚合技术制备光致抗蚀剂聚合物。 用作单体体积大的酯单体作为聚合组分。 链转移剂的使用包括在聚合工艺条件中。 描述了包含杂原子的聚合物末端基团的切割。
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公开(公告)号：US20060217519A1
公开(公告)日：2006-09-28
申请号：US11300658
申请日：2005-12-12
申请人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
发明人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
IPC分类号： C08G63/00
CPC分类号： C08F220/28 , C08F20/18 , G03F7/0397
摘要： The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
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公开(公告)号：US20050059787A1
公开(公告)日：2005-03-17
申请号：US10877110
申请日：2004-06-25
申请人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
发明人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
IPC分类号： C08F2/38 , C08F20/30 , C08F220/18 , C08F220/30 , C08F293/00 , G03F7/004 , G03F7/039 , C08F2/00
CPC分类号： C08F220/30 , C08F2/38 , C08F20/30 , C08F220/18 , C08F293/005 , G03F7/0046 , G03F7/0397
摘要： The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
摘要翻译： 本发明涉及通过活性自由基聚合技术制备光致抗蚀剂聚合物。 用作单体体积大的酯单体作为聚合组分。 链转移剂的使用包括在聚合工艺条件中。 描述了包含杂原子的聚合物末端基团的切割。
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公开(公告)号：US07510817B2
公开(公告)日：2009-03-31
申请号：US11300657
申请日：2005-12-12
申请人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Isao Nishimura , Akimasa Soyano , Kenji Okamoto , Yong Wang
发明人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Isao Nishimura , Akimasa Soyano , Kenji Okamoto , Yong Wang
CPC分类号： C08F220/18 , C08F20/18 , C08F220/28 , G03F7/0397
摘要： The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
摘要翻译： 本发明涉及通过活性自由基聚合技术制备光致抗蚀剂聚合物。 用作单体体积大的酯单体作为聚合组分。 链转移剂的使用包括在聚合工艺条件中。 描述了包含杂原子的聚合物末端基团的切割。
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公开(公告)号：US20070185276A1
公开(公告)日：2007-08-09
申请号：US11734474
申请日：2007-04-12
申请人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
发明人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
IPC分类号： C08F287/00
CPC分类号： C08F220/30 , C08F2/38 , C08F20/30 , C08F220/18 , C08F293/005 , G03F7/0046 , G03F7/0397
摘要： The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
摘要翻译： 本发明涉及通过活性自由基聚合技术制备光致抗蚀剂聚合物。 用作单体体积大的酯单体作为聚合组分。 链转移剂的使用包括在聚合工艺条件中。 描述了包含杂原子的聚合物末端基团的切割。
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公开(公告)号：US07517634B2
公开(公告)日：2009-04-14
申请号：US11300658
申请日：2005-12-12
申请人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
发明人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
CPC分类号： C08F220/28 , C08F20/18 , G03F7/0397
摘要： The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
摘要翻译： 本发明涉及通过活性自由基聚合技术制备光致抗蚀剂聚合物。 用作单体体积大的酯单体作为聚合组分。 链转移剂的使用包括在聚合工艺条件中。 描述了包含杂原子的聚合物末端基团的切割。
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公开(公告)号：US20060257781A1
公开(公告)日：2006-11-16
申请号：US11300657
申请日：2005-12-12
申请人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Isao Nishimura , Akimasa Soyano , Kenji Okamoto , Yong Wang
发明人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Isao Nishimura , Akimasa Soyano , Kenji Okamoto , Yong Wang
IPC分类号： G03C1/00
CPC分类号： C08F220/18 , C08F20/18 , C08F220/28 , G03F7/0397
摘要： The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
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公开(公告)号：US20060122346A9
公开(公告)日：2006-06-08
申请号：US10877110
申请日：2004-06-25
申请人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
发明人： Didier Benoit , Adam Safir , Han-Ting Chang , Dominique Charmot , Kenji Okamoto , Isao Nishimura , Yong Wang
IPC分类号： C08F2/00
CPC分类号： C08F220/30 , C08F2/38 , C08F20/30 , C08F220/18 , C08F293/005 , G03F7/0046 , G03F7/0397
摘要： The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
摘要翻译： 本发明涉及通过活性自由基聚合技术制备光致抗蚀剂聚合物。 用作单体体积大的酯单体作为聚合组分。 链转移剂的使用包括在聚合工艺条件中。 描述了包含杂原子的聚合物末端基团的切割。
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10.发明申请Olefin-hydrophilic block copolymers of controlled sizes and methods of making and using the same 审中-公开受控尺寸的烯烃 - 亲水嵌段共聚物及其制备和使用方法公开(公告)号：US20050059779A1
公开(公告)日：2005-03-17
申请号：US10689775
申请日：2003-10-20
申请人： Han-Ting Chang , Dominique Charmot , Damian Hajduk , Manikandan Jayaraman , Florence Roger , Victor Nava-Salgado , Adam Safir
发明人： Han-Ting Chang , Dominique Charmot , Damian Hajduk , Manikandan Jayaraman , Florence Roger , Victor Nava-Salgado , Adam Safir
IPC分类号： C08F293/00 , C08L53/00
CPC分类号： C08F293/005
摘要： A method for controlling the size of the blocks in a bock copolymer having an olefinic block and a hydrophilic block is disclosed. The method results in block copolymers having novel properties, including the ability to increase the wetability of an olefinic substrate.
摘要翻译： 公开了一种用于控制具有烯烃嵌段和亲水嵌段的嵌段共聚物中嵌段的尺寸的方法。 该方法产生具有新特性的嵌段共聚物，包括增加烯烃基材的润湿性的能力。
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